High-Purity Monocrystalline Silicon Wafer, Single or Double Polished Semiconductor Substrate for Coating and SEM, 2–12 Inch (4" SSP DSO 300nm)

This monocrystalline silicon wafer is designed for semiconductor research, thin-film deposition, and analytical laboratory work. Each wafer features high surface quality and stable material properties, making it suitable for metal coating, oxide layers, and general research applications. With options from 2 to 12 inches and both single-side and double-side polished finishes, it supports a wide range of academic, industrial, and prototyping needs.

• High-Purity Silicon Substrate: Manufactured from monocrystalline silicon, suitable for semiconductor processing, thin-film studies, and material research.
• Polished Surface Options: Available in single-side or double-side polished finishes for applications requiring precise flatness and smoothness.
• Compatible with Various Coatings: Ideal for laboratory deposition such as metal films, oxide layers, dielectric coatings, and general surface preparation.
• Stable for SEM and Analysis: Provides uniform structure and high surface quality, suitable for microscopy observation and analytical experiments.
• Size Range 2–12 Inch: Multiple diameter options for research, prototyping, display use, and semiconductor education.